New equipment – chlorine etching
New equipment is now available at the Microfabrication Laboratory (LMF) at Polytechnique Montréal. As this laboratory is an RQMP platform, our members have access to it at reduced rates.
Chlorine-based etching is now available on their Oxford RIE (Reactive Ion Etching) system.
Cl₂ and BCl₃ gases can now be used for etching metals (Cr, Ti, Al, Ge, etc.) as well as III-V materials (GaN, etc.).
For further information, please contact
